Dual Beam Focused Ion Beam
Versa™ 3D DualBeam™ (FIB/SEM)
The instrument is a Focused Ion Beam (FIB) combined with a Scanning Electron Microscopy (SEM). In a DualBeam, the electron and ion beams intersect at a 52° angle at a coincident point near the sample surface, allowing immediate, high resolution SEM imaging of the FIB-milled surface. Such systems combine the benefits of both the SEM and FIB and provide complementary imaging and beam chemistry capabilities.
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Main instrument features:
- The combination of high and low vacuum modes gives the flexibility to work with a range of samples including uncoated and non-conductive samples
- Environmental SEM (ESEM) mode allows electron beam imaging of naturally hydrated samples
- Software routines for ease of use and automation
- SEM resolution down to 1.2 nm and FIB resolution down to 5 nm, depending on the operating conditions
- Patterning system included
- Electron/ion assisted deposition of Pt and C (there is the possibility to deposit also other 3 elements)
- Manipulation system Omniprobe 100.7 for in-situ TEM lamellae preparation
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