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Electron Beam Lithography
Multi Technique Electron Beam Lithography
Raith nanofabrication, eLINE Plus
eLINE Plus combines an Electron Beam Lithography system with an open platform for further optional nanofabrication processes and techniques in a single tool.
Main instrumental features:
Advanced TFE electron column offering the world´s smallest beam size
Resolution <5nm
Open and upgradable platform concept
Wide range of nanofabrication processes
Inlense SE detector
Unique stitch-error-free writing modes, traxx and periodixx
Raith NanoSuite: comprehensive software interface with all modules fully integrated
